Metal organic chemical vapor deposition and investigation of ZnO thin films grown on sapphire
نویسندگان
چکیده
A new type of large area metal organic chemical vapor deposition (MOCVD) system for the growth of high quality and large size ZnO materials is introduced. Materials properties of the un-doped, nand p-doped ZnO epi-films grown on sapphire substrates by this MOCVD system are studied by various techniques, including high resolution X-ray diffraction (XRD), UV–Visible optical transmission (OT), photoluminescence (PL) and photoluminescence excitation (PLE), synchrotron radiation X-ray photoelectron spectroscopy (SR-XPS). The wurtzite (w) ZnO crystal structures grown with primary (0002) orientation were identified. Results have shown the high crystalline quality of MOCVD-grown ZnO films, indicated by the narrow XRD, PL and Raman line widths, strong PL signals, sharp OT edge and smooth surface. In particular, high p-type carrier concentration of N10 cm have been achieved besides the good n-type doping in ZnO. © 2007 Elsevier B.V. All rights reserved.
منابع مشابه
Characterization of ZnO Thin Films Grown on c-Sapphire by Pulsed Laser Deposition as Templates for Regrowth of ZnO by Metal Organic Chemical Vapor Deposition
The use of ZnO template layers grown Pulsed Laser Deposition (PLD) has been seen to produce dramatic improvements in the surface morphology, crystallographic quality and optical properties of ZnO layers grown on c-sapphire substrates by Metal Organic Chemical Vapor Deposition. This paper provides complementary details on the PLD-grown ZnO template properties.
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